The 8250-R reticle CD control system, which is based on the 8200/8400 CD SEM platform. The 8250-R provides extremely precise and high-throughput measurements on        advanced reticles used in the production of sub-0.13-micron devices.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

8250-R

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