説明
CD SEM構成
構成なしOEMモデルの説明
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.ドキュメント
ドキュメントなし
KLA
8250
検証済み
カテゴリ
CD-SEM
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
99167
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
8250
検証済み
カテゴリ
CD-SEM
最終検証： 26日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
99167
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
CD SEM構成
構成なしOEMモデルの説明
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.ドキュメント
ドキュメントなし