説明
T&H unit is not working correctly and needs replace Unit 2-4 chuck will not spin, motor is dead and needs replaced Controller: ACT Controller Configuration: 4COT/2DEV Stepper interface: No Wafer Direction: RtoL Accessory AC Power Box 200V/150A AC Power Cable: 3 phase TCU Model: INR-244-265B-6500 T&H Model: T&H-ESA-6-C-13 Chiller Model: HCW5000-PR-NF-MB Chemical Cabinet (Qty): 1 Coater Unit Unit 2-1 Resist Nozzles (Qty): 2 Resist Pumps (Type):F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain type: Buffer Drain Unit 2-2 Resist Nozzles (Qty): 4 Resist Pumps (Type): F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain: Buffer drain Unit 2-3 Resist Nozzles (Qty): 4 Resist Pumps (Type): F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain: Buffer drain Unit 2-4 Resist Nozzles (Qty): 4 Resist Pumps (Type):F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain type: Buffer Drain Develop Units Unit 3-1 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes Unit 3-2 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes構成
1.5 Block 4C2DOEMモデルの説明
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.ドキュメント
ドキュメントなし
カテゴリ
Coaters & Developers
最終検証： 今日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
146147
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
ACT 8
カテゴリ
Coaters & Developers
最終検証： 今日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
146147
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
T&H unit is not working correctly and needs replace Unit 2-4 chuck will not spin, motor is dead and needs replaced Controller: ACT Controller Configuration: 4COT/2DEV Stepper interface: No Wafer Direction: RtoL Accessory AC Power Box 200V/150A AC Power Cable: 3 phase TCU Model: INR-244-265B-6500 T&H Model: T&H-ESA-6-C-13 Chiller Model: HCW5000-PR-NF-MB Chemical Cabinet (Qty): 1 Coater Unit Unit 2-1 Resist Nozzles (Qty): 2 Resist Pumps (Type):F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain type: Buffer Drain Unit 2-2 Resist Nozzles (Qty): 4 Resist Pumps (Type): F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain: Buffer drain Unit 2-3 Resist Nozzles (Qty): 4 Resist Pumps (Type): F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain: Buffer drain Unit 2-4 Resist Nozzles (Qty): 4 Resist Pumps (Type):F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain type: Buffer Drain Develop Units Unit 3-1 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes Unit 3-2 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes構成
1.5 Block 4C2DOEMモデルの説明
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.ドキュメント
ドキュメントなし