説明

IMMERSION TRACK

構成

Please find the below attached file

OEMモデルの説明

CLEAN TRACK™ LITHIUS Pro™ V incorporates all of the advanced technology of the proven CLEAN TRACK™ LITHIUS Pro™ V. It enables higher throughput, increases wafers per day, and improves overall equipment efficiency. Additionally, it also meets industry requirements for versatile lithography equipment capable of leading edge processes, including double patterning.