説明
Photo Resist構成
PhotoOEMモデルの説明
The CLEAN TRACK™ Mark-V is a 30-year-old coater that has revolutionized the concept of conventional photoresist systems. It has introduced various innovative technologies such as a stacked clean oven module layout and high-speed wafer handling robotics, setting worldwide standards for photoresist systems. The Mark-V is capable of handling 75, 100, and 150mm wafers at a rate of 60 wafers per hour and is an open system. It’s an impressive piece of technology!ドキュメント
ドキュメントなし
カテゴリ
Coaters & Developers
最終検証： 10日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
139292
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1991
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
MARK V
カテゴリ
Coaters & Developers
最終検証： 10日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
139292
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1991
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Photo Resist構成
PhotoOEMモデルの説明
The CLEAN TRACK™ Mark-V is a 30-year-old coater that has revolutionized the concept of conventional photoresist systems. It has introduced various innovative technologies such as a stacked clean oven module layout and high-speed wafer handling robotics, setting worldwide standards for photoresist systems. The Mark-V is capable of handling 75, 100, and 150mm wafers at a rate of 60 wafers per hour and is an open system. It’s an impressive piece of technology!ドキュメント
ドキュメントなし