説明
Multi Block (Resist Coater/Developer)構成
構成なしOEMモデルの説明
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
LITHIUS Pro Z
検証済み
カテゴリ
Coaters & Developers
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
116378
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
LITHIUS Pro Z
カテゴリ
Coaters & Developers
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
116378
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Multi Block (Resist Coater/Developer)構成
構成なしOEMモデルの説明
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.ドキュメント
ドキュメントなし