説明
説明なし構成
Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEMモデルの説明
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 7日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
142476
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA HDP
カテゴリ
CVD
最終検証： 7日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
142476
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEMモデルの説明
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.ドキュメント
ドキュメントなし