説明

Includes - Remote AC Box - AMAT-0 Heat Exchanger - Remote RF Rack - Mini-Controller - Interconnect cables - Ozonator Rack All chambers have been fully cleaned and tests completed to confirm chambers are pH neutral. Gas panel fully pump-purged and gas inlets capped off. Software E4.26 has been left loaded on the hard drive. The nitride chamber has a p-chuck installed which is faulty. Details Attached

構成

Chambers - 1 x Teos Oxide CVD (hot-box ampule configuration) - 1 x Silane Oxide CVD - 1 x Nitride CVD

OEMモデルの説明

The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.