説明
P-5000 Mark II DLH SACVD構成
CVD DxL SACVD TEOS SACVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software: b6.02 MF: P5000 Mark II Qty 4 - DLH SACVD: TEOS Deposition Chuck: Anodized Aluminum MFCs: 24 Horiba Z500 Digital MFCs Robot: ROBOT ASSY 8 IN AMAT 5000 Dry Pumps: 4 IXH620, 1 Edwards IXL120 Chillers: AMAT Heatex 1 Edwards Atlas Abatement Upgrades: PLIS, V440 SBC Power glitch protection Known Missing Parts: Heater jackets, AI board Qty 1 ; Tool is not completeOEMモデルの説明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
125401
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
ヴィンテージ：
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
P5000 CVD
カテゴリ
CVD
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
125401
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
ヴィンテージ：
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
P-5000 Mark II DLH SACVD構成
CVD DxL SACVD TEOS SACVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software: b6.02 MF: P5000 Mark II Qty 4 - DLH SACVD: TEOS Deposition Chuck: Anodized Aluminum MFCs: 24 Horiba Z500 Digital MFCs Robot: ROBOT ASSY 8 IN AMAT 5000 Dry Pumps: 4 IXH620, 1 Edwards IXL120 Chillers: AMAT Heatex 1 Edwards Atlas Abatement Upgrades: PLIS, V440 SBC Power glitch protection Known Missing Parts: Heater jackets, AI board Qty 1 ; Tool is not completeOEMモデルの説明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.ドキュメント
ドキュメントなし