説明

Details Attached.

構成

TEOS CVD (3 Deposition PLIS, 1 Sputter Etch Chamber) Ebara Dry pumps (Fully Refurbished) : 3 Ea. of 50x20 Ebara pumps + 2 Ea. of 40x20 Ebara pumps Gas Scrubber : Delatech Scrubber Model 859

OEMモデルの説明

The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.