説明
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 Phase構成
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEMモデルの説明
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 今日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150735
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA ULTIMA HDP-CVD
カテゴリ
CVD
最終検証： 今日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150735
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 Phase構成
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEMモデルの説明
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.ドキュメント
ドキュメントなし