説明
説明なし構成
構成なしOEMモデルの説明
The WJ-1000H Hydride system deposits doped or undoped silicon dioxide (SiO2) films, created from the Silane/Oxygen CVD reaction. It is capable of processing 100-mm to 200-mm wafers and has demonstrated high productivity and reliability. The system is designed for process flexibility and produces consistent film properties over the entire wafer surface. It has a low cost of ownership due to its MonoBlok™ Linear injector and high throughput.ドキュメント
ドキュメントなし
AVIZA / WATKINS-JOHNSON
WJ 1000H
検証済み
カテゴリ
CVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
63313
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AVIZA / WATKINS-JOHNSON
WJ 1000H
カテゴリ
CVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
63313
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The WJ-1000H Hydride system deposits doped or undoped silicon dioxide (SiO2) films, created from the Silane/Oxygen CVD reaction. It is capable of processing 100-mm to 200-mm wafers and has demonstrated high productivity and reliability. The system is designed for process flexibility and produces consistent film properties over the entire wafer surface. It has a low cost of ownership due to its MonoBlok™ Linear injector and high throughput.ドキュメント
ドキュメントなし