WJ-999
カテゴリ
CVD概要（Overview）
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.
現在の掲載品
5
サービス
検査、保証、鑑定、ロジスティクス
