説明
Configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Condition: Complete / Working Status: Installed in cleanroom構成
FIRST NANO EasyTube 3000 Graphene Furnace Configured: 3" wafers and small pieces Materials: Ar, H2, SiH4, CH4 Quartz chamber with graphite susceptor 10kW RF induction heating 2200C max Fully programmable Turbo pump for low pre-processing base pressure (9.0e-7 Torr)OEMモデルの説明
提供なしドキュメント
ドキュメントなし
FIRST NANO
EasyTube 3000
検証済み
カテゴリ
CVD
最終検証： 14日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Idle
製品ID：
110952
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
FIRST NANO
EasyTube 3000
カテゴリ
CVD
最終検証： 14日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Idle
製品ID：
110952
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Condition: Complete / Working Status: Installed in cleanroom構成
FIRST NANO EasyTube 3000 Graphene Furnace Configured: 3" wafers and small pieces Materials: Ar, H2, SiH4, CH4 Quartz chamber with graphite susceptor 10kW RF induction heating 2200C max Fully programmable Turbo pump for low pre-processing base pressure (9.0e-7 Torr)OEMモデルの説明
提供なしドキュメント
ドキュメントなし