説明

FIRST NANO EASY TUBE 3000 EXT System Vintage: 2012 Includes 2 Gas Cabinets: EasyGasTM 1000 Gas Cabinet for H2, CH4 & C2H4 EasyGasTM 1500 Gas Cabinet for Diborane & Phosphine Dopants Gas Panel for Process Ar (48" flexible connection) BUSCH BA 100 Roughing pump Spare Quartzware Purchased new from FirstNano in 2011 and partially installed since 2013. Never completely powered on. The computer was powered on, and everything worked great. No gases flowed through the system. Essentially brand new and never used.

構成

FIRST NANO EASY TUBE 3000 EXT System: EasyTubeTM 3000EXT System for either Carbon Nanotube, Silicon Nanowire or Graphene growth per Technical Specification TS-2398N including as a minimum: • Complete set of process quartzware and seals capable of processing a substrate up to 50mm in diameter • Computer control system • Eleven (11) MFC gas lines with individual flow rate controls • Low pressure vapor delivery for H2O liquid precursor • Low pressure vapor delivery system for SiCl4 liquid precursor • Static mixer for optimum gas mixing • Integrated automatic vacuum system for low pressure operation • Load Lock – isolates the process tube from ambient atmosphere during loading/unloading operations and allows for pumping the loadlock to <50 millitorr • Three zone furnace with internal multi-point cascade temperature control • Process temperature - up to 1100oC • Air-to-Water Heat Exchanger - eliminates the need for cooling water to the system • EGC-410 Exhaust Gas Conditioning System • Spare set of quartzware (process tube, paddle, liner, thermal plug, sheaths), O- Rings, Thermocouple, Exhaust Filter Media • Quartz liner to protect the process tube while growing graphene on a copper substrate • Process recipe included – Long CNT growth, Silicon Nanowire growth and Graphene growth • Interconnecting gas lines between ET-3000EXT and EGC based on all systems being located within the same room • EasyGasTM 1000 H2, CH4 & C2H4 o Manual 3-Cylinder Gas Cabinet for Hydrogen, Methane and Ethylene with an external Nitrogen purge cylinder and Flammable Gas Monitoring o Configured with a 3-Valve Process Panel - with PURGE/EVACUATION for Hydrogen, Methane and Ethylene. o Configured with a 2-Valve Purge Panel for Nitrogen. o Includes Emergency Shutoff Controller. • EasyGasTM 1500 for Diborane & Phosphine Dopants o Automated 3-Cylinder Gas Cabinet for PPM Diborane/Argon and PPM Phosphine/Argon Dopants and Nitrogen includes: o Adjustable Cylinder Shelves for Diborane and Phosphine o Flammable Gas Leak Detection • ET-MFC Mass Flow Controller – for Spare Gas Line • Purge Panel for N2 (48" flexible connection)