説明
NOVELLUS INOVA CUSEED構成
CU SEED CIM - GEM Main System - Mainframe Factory Interface - (QTY 2) SMIF Handler System - (QTY 2) RobotOEMモデルの説明
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
151296
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
LAM RESEARCH / NOVELLUS
INOVA
カテゴリ
CVD
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
151296
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
NOVELLUS INOVA CUSEED構成
CU SEED CIM - GEM Main System - Mainframe Factory Interface - (QTY 2) SMIF Handler System - (QTY 2) RobotOEMモデルの説明
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.ドキュメント
ドキュメントなし