メインコンテンツにスキップ
Moov logo

Moov Icon
APPLIED MATERIALS (AMAT) SEMVISION G7
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Applied SEMVision G7 system offers greater imaging variety and advances in automatic defect classification (ADC) based on expanded machine learning capabilities. Besides the imaging capabilities of the previous SEMVision generation, the new system offers unique imaging of the wafer-edge bevel and apex where undetected defects can reduce device yield. To achieve robust review of unpatterned wafers, an enhanced light source and collection mechanism combined with improved noise suppression enable optical detection of defects as small as 18nm.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Defect Inspection

    最終検証: 2日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    150294


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) SEMVISION G7

    APPLIED MATERIALS (AMAT)

    SEMVISION G7

    Defect Inspection
    ヴィンテージ: 0状態: 中古
    最終確認2日前

    APPLIED MATERIALS (AMAT)

    SEMVISION G7

    verified-listing-icon
    検証済み
    カテゴリ
    Defect Inspection
    最終検証: 2日前
    listing-photo-43d1d192b9f54f4b9a9683982f1889fe-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    150294


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Applied SEMVision G7 system offers greater imaging variety and advances in automatic defect classification (ADC) based on expanded machine learning capabilities. Besides the imaging capabilities of the previous SEMVision generation, the new system offers unique imaging of the wafer-edge bevel and apex where undetected defects can reduce device yield. To achieve robust review of unpatterned wafers, an enhanced light source and collection mechanism combined with improved noise suppression enable optical detection of defects as small as 18nm.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) SEMVISION G7

    APPLIED MATERIALS (AMAT)

    SEMVISION G7

    Defect Inspectionヴィンテージ: 0状態: 中古最終検証:2日前