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KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
説明
説明なし
構成
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEMモデルの説明
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
ドキュメント

ドキュメントなし

カテゴリ
Defect Inspection

最終検証: 60日以上前

主なアイテムの詳細

状態:

Refurbished


稼働ステータス:

不明


製品ID:

101992


ウェーハサイズ:

6"/150mm


ヴィンテージ:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

CANDELA OSA-6100

verified-listing-icon
検証済み
カテゴリ
Defect Inspection
最終検証: 60日以上前
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/1c8a2b6d370b4e1e924015956d108fe7_2_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/be51dfbbef7d4b6fb5f28e4ea7efa111_1_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/485ae4d985684bc3a9bda518effa6a2f_4_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/7bf686ce73dc442696cbdb6f62d15783_spk3632_mw.jpg
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/5c44323dce4c44c79036257d84eefc90_3_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/10b7fd1f006847c59fad2da85a59a40e_spk3633_mw.jpg
主なアイテムの詳細

状態:

Refurbished


稼働ステータス:

不明


製品ID:

101992


ウェーハサイズ:

6"/150mm


ヴィンテージ:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし
構成
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEMモデルの説明
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
ドキュメント

ドキュメントなし