201
概要（Overview）
The KLA-201 Automatic Photomask Inspection Station allows you to inspect photomasks and multidie reticles for random defects today and to quickly add repeating defect inspection and single-die reticle inspection capability tomorrow. In addition, glass wafers can be inspected for both random and repeating defects.
現在の掲載品
6
サービス
検査、保証、鑑定、ロジスティクス
