説明
説明なし構成
2 mainframe +6 twin chambers + 1 EFEMOEMモデルの説明
Applied Centris AdvantEdge Mesa Etch, the smartest, fastest silicon etch system made for the volume production of the world’s most advanced memory and logic chips. Featuring an unprecedented eight process chambers – six etch and two plasma clean chambers – the compact Centris system can process up to 180 wafers per hour, lowering the per-wafer cost by up to 30%. Proprietary system intelligence software assures every process on every chamber precisely matches, delivering angstrom-level uniformity on every wafer – a critical requirement for high yield in tomorrow’s highly-complex chip designs.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTRIS ADVANTEDGE MESA ETCH
検証済み
カテゴリ
Dry Etch
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
99700
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTRIS ADVANTEDGE MESA ETCH
検証済み
カテゴリ
Dry Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
99700
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
2 mainframe +6 twin chambers + 1 EFEMOEMモデルの説明
Applied Centris AdvantEdge Mesa Etch, the smartest, fastest silicon etch system made for the volume production of the world’s most advanced memory and logic chips. Featuring an unprecedented eight process chambers – six etch and two plasma clean chambers – the compact Centris system can process up to 180 wafers per hour, lowering the per-wafer cost by up to 30%. Proprietary system intelligence software assures every process on every chamber precisely matches, delivering angstrom-level uniformity on every wafer – a critical requirement for high yield in tomorrow’s highly-complex chip designs.ドキュメント
ドキュメントなし