説明
Metal CVD (Chemical Vapor Deposition)構成
Applied Materials (AMAT) Centura 5200 Ti/TiN MCVD Install Type:Stand Alone Software Version:B4226 Is System On-Line? Yes CE Mark Certified? Yes Clean Room Manuals:No Standard Manuals:No OEM Audit Available? Yes Decontamination Report Exists? Yes Can Produce Wafers AS IS? Yes Any Known Field Modifications? No All Cables Present? Yes Mainframe Type:Centura (Common) System Configuration Chamber / Process Position A:CVD / TiN Position B:CVD / TiN Position C:CVD / Ti Position D:CVD / Ti Directory of Chamber Types for TxZ, TixZ:MCVD Multi-Slot Cooldown:Cooldown Wafer Orienter:Orienter Mainframe Items Signal Lamp Tower:Yes Loadlock Type :Wide body Wafer Mapping:Fast Wafer Slide Sensor:Yes Bolt-On-SMIF:Yes SMIF Loader Make/Model:ASYST/LPT2200 Robot Type:HP+ Blade Type:Quartz Transfer Lid Hoist:No Wafer on Blade Sensor:OTF SBC Version:V452 Remote Service Monitors:No GEMS:No RF Generator Details Chamber Position :Mfgr. / Model Position A :AE / PDX 900-2V Position B :AE / PDX 900-2V Position C :AE / PDX 900-2V Position D :AE / PDX 900-2V Dep Chamber Roughing Pumps Dep Chamber Pump Manufacturer:Edward Model:iH600 Quantity Required:4 Included With System:No Load Lock Pump Manufacturer:Edward Model:iH80 Included With System:No Transfer Chamber Pump Manufacturer:Edward Model:iH80 Included With System:No AMAT Heat Exchanger Model:Steelhead Quantity Required:2 Included With System:No Gas Box Configuration Gas Delivery Type:SLD Gas Panel Interface Type:Standard Gas Panel Exhaust:Top Liquid Delivery Type:TICL4 Gas Box Configuration Gas Line # Gas / Flow (sccm) / MFC Mfgr. / MFC Model 1 Ar / 1000 / STEC / SEC4400M 2 N2 / 1000 / STEC / SEC4400M 3 H2 / 5000 / STEC / SEC4400M 4 Ar / 10000 / STEC / SEC4400M 5 Cl2 / 500 / STEC / SEC4400M 6 Ar / 1000 / STEC / SEC4400M 7 He / 3000 / STEC / SEC4400M 8 NH3 / 1000 / STEC / SEC4400MOEMモデルの説明
Reactor/ MOCVDドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA I PHASE II
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
77630
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA I PHASE II
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
77630
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Metal CVD (Chemical Vapor Deposition)構成
Applied Materials (AMAT) Centura 5200 Ti/TiN MCVD Install Type:Stand Alone Software Version:B4226 Is System On-Line? Yes CE Mark Certified? Yes Clean Room Manuals:No Standard Manuals:No OEM Audit Available? Yes Decontamination Report Exists? Yes Can Produce Wafers AS IS? Yes Any Known Field Modifications? No All Cables Present? Yes Mainframe Type:Centura (Common) System Configuration Chamber / Process Position A:CVD / TiN Position B:CVD / TiN Position C:CVD / Ti Position D:CVD / Ti Directory of Chamber Types for TxZ, TixZ:MCVD Multi-Slot Cooldown:Cooldown Wafer Orienter:Orienter Mainframe Items Signal Lamp Tower:Yes Loadlock Type :Wide body Wafer Mapping:Fast Wafer Slide Sensor:Yes Bolt-On-SMIF:Yes SMIF Loader Make/Model:ASYST/LPT2200 Robot Type:HP+ Blade Type:Quartz Transfer Lid Hoist:No Wafer on Blade Sensor:OTF SBC Version:V452 Remote Service Monitors:No GEMS:No RF Generator Details Chamber Position :Mfgr. / Model Position A :AE / PDX 900-2V Position B :AE / PDX 900-2V Position C :AE / PDX 900-2V Position D :AE / PDX 900-2V Dep Chamber Roughing Pumps Dep Chamber Pump Manufacturer:Edward Model:iH600 Quantity Required:4 Included With System:No Load Lock Pump Manufacturer:Edward Model:iH80 Included With System:No Transfer Chamber Pump Manufacturer:Edward Model:iH80 Included With System:No AMAT Heat Exchanger Model:Steelhead Quantity Required:2 Included With System:No Gas Box Configuration Gas Delivery Type:SLD Gas Panel Interface Type:Standard Gas Panel Exhaust:Top Liquid Delivery Type:TICL4 Gas Box Configuration Gas Line # Gas / Flow (sccm) / MFC Mfgr. / MFC Model 1 Ar / 1000 / STEC / SEC4400M 2 N2 / 1000 / STEC / SEC4400M 3 H2 / 5000 / STEC / SEC4400M 4 Ar / 10000 / STEC / SEC4400M 5 Cl2 / 500 / STEC / SEC4400M 6 Ar / 1000 / STEC / SEC4400M 7 He / 3000 / STEC / SEC4400M 8 NH3 / 1000 / STEC / SEC4400MOEMモデルの説明
Reactor/ MOCVDドキュメント
ドキュメントなし