説明
ETCH構成
ETCHOEMモデルの説明
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA II EMAX CT+
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
23723
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA II EMAX CT+
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
23723
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
ETCH構成
ETCHOEMモデルの説明
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.ドキュメント
ドキュメントなし