説明
Plasma構成
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEMモデルの説明
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
142376
ウェーハサイズ：
不明
ヴィンテージ：
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA IPS
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
142376
ウェーハサイズ：
不明
ヴィンテージ：
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Plasma構成
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEMモデルの説明
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.ドキュメント
ドキュメントなし