説明
Vacuum plasma processing system構成
Chamber volume: 18–36 L, depending on version Tabletop system power supply: 230 VAC Standalone system power supply: 400 VAC, 3-phase Gas supply options: Needle valves Mass flow controllers (MFCs) Vacuum chamber options - Stainless steel: Round chamber with cover: Approx. Ø267 × L420 or L600 mm Rectangular chamber with hinged door: Approx. W240 × H240 × D420 or D600 mm Vacuum chamber options - Aluminum: Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Quartz glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Borosilicate glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Loading options: Tray with optional water cooling Quartz glass boats Rotary drum for powder Rotary drum for bulk materials Flat trays: Aluminum / stainless steel / borosilicate glass / quartz glass Electrode options: Single-level or multilevel electrode RIE electrode Control options: Semiautomatic PCCE control: Microsoft Windows CE PC control: Microsoft Windows XPE Timer: Digital Generator options: 40 kHz: 0–300 W or 0–1,000 W 13.56 MHz: 0–100 W or 0–300 W 2.45 GHz: 0–600 W Output continuously adjustable from 0–100% Vacuum pump options: Various sizes and manufacturers Optional activated carbon filterOEMモデルの説明
Low-pressure plasma treatment unitドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
154930
ウェーハサイズ：
不明
ヴィンテージ：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
DIENER ELECTRONIC
Nano SL PCCE
カテゴリ
Dry / Plasma Etch
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
154930
ウェーハサイズ：
不明
ヴィンテージ：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Vacuum plasma processing system構成
Chamber volume: 18–36 L, depending on version Tabletop system power supply: 230 VAC Standalone system power supply: 400 VAC, 3-phase Gas supply options: Needle valves Mass flow controllers (MFCs) Vacuum chamber options - Stainless steel: Round chamber with cover: Approx. Ø267 × L420 or L600 mm Rectangular chamber with hinged door: Approx. W240 × H240 × D420 or D600 mm Vacuum chamber options - Aluminum: Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Quartz glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Borosilicate glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Loading options: Tray with optional water cooling Quartz glass boats Rotary drum for powder Rotary drum for bulk materials Flat trays: Aluminum / stainless steel / borosilicate glass / quartz glass Electrode options: Single-level or multilevel electrode RIE electrode Control options: Semiautomatic PCCE control: Microsoft Windows CE PC control: Microsoft Windows XPE Timer: Digital Generator options: 40 kHz: 0–300 W or 0–1,000 W 13.56 MHz: 0–100 W or 0–300 W 2.45 GHz: 0–600 W Output continuously adjustable from 0–100% Vacuum pump options: Various sizes and manufacturers Optional activated carbon filterOEMモデルの説明
Low-pressure plasma treatment unitドキュメント
ドキュメントなし