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説明
説明なし構成
構成なしOEMモデルの説明
HS-9050 is equipped with a gas system compatible with both organic and inorganic films. Processing can be flexibly set based on the structure of the film layers, enabling the entire removal process of multilayer resists in next-generation devices to be performed within the same chamber. Meanwhile, helical downflow plasma has been newly adopted as the plasma source, resulting in a highly efficient, less damaging process.ドキュメント
ドキュメントなし
HITACHI
HS-9050
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
125859
ウェーハサイズ：
不明
ヴィンテージ：
2019
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説明
説明なし構成
構成なしOEMモデルの説明
HS-9050 is equipped with a gas system compatible with both organic and inorganic films. Processing can be flexibly set based on the structure of the film layers, enabling the entire removal process of multilayer resists in next-generation devices to be performed within the same chamber. Meanwhile, helical downflow plasma has been newly adopted as the plasma source, resulting in a highly efficient, less damaging process.ドキュメント
ドキュメントなし