We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 続きを読む
説明
説明なし構成
Type: 300mm M712 mainframe M711 setup one Etch chamber Software revision: 1.07 PMv.02.16M Etcher, 12" (3) Cassettes Positions SECS II Interface: HSMS Neslab coolflow III Chiller Power supply: 208 VAC, 3-Phase, 50/60 Hz Mainframe: Robot P/N: CR-712V HITACHI 3 position Loader Chamber: ESC Type: Bipolar Endpoint type: Hitachi EPD monitor ePMv02.16M SHIMAZU EC TMP 3203LMC-K1 EC TMP Controller DAIHEN ES7-IIA EC Source generator PEARL CF-500-400K EC Bias generator Gas configuration: Line / EC1 / Strip 1 / Ar 2 / C12 3 / SF6 4 / HBr 5 / CF3 6 / CH4 7 / NF3 8 / O2 9 / N2 10/ SF6 11/ C12 12/ O2OEMモデルの説明
提供なしドキュメント
ドキュメントなし
HITACHI
M 712
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
65310
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Type: 300mm M712 mainframe M711 setup one Etch chamber Software revision: 1.07 PMv.02.16M Etcher, 12" (3) Cassettes Positions SECS II Interface: HSMS Neslab coolflow III Chiller Power supply: 208 VAC, 3-Phase, 50/60 Hz Mainframe: Robot P/N: CR-712V HITACHI 3 position Loader Chamber: ESC Type: Bipolar Endpoint type: Hitachi EPD monitor ePMv02.16M SHIMAZU EC TMP 3203LMC-K1 EC TMP Controller DAIHEN ES7-IIA EC Source generator PEARL CF-500-400K EC Bias generator Gas configuration: Line / EC1 / Strip 1 / Ar 2 / C12 3 / SF6 4 / HBr 5 / CF3 6 / CH4 7 / NF3 8 / O2 9 / N2 10/ SF6 11/ C12 12/ O2OEMモデルの説明
提供なしドキュメント
ドキュメントなし