説明
Wafer Edge Cleaning - Plasma構成
構成なしOEMモデルの説明
The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
91745
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 CORONUS
カテゴリ
Dry / Plasma Etch
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
91745
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Wafer Edge Cleaning - Plasma構成
構成なしOEMモデルの説明
The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.ドキュメント
ドキュメントなし