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LAM RESEARCH CORPORATION RAINBOW 4420
    説明
    Plasma Etch
    構成
    Install Type: Thru-the-wall (TTW) Status Lamp System software (App): Envision ver1.5.1 SECS I Interface Cassette Interface: (2) Hine 38F indexers Electrostatic Chuck (ESC) Endpoint Detection: Monochromator 405nm / 520nm Turbo: Seiko Seiki STP H200C RF Match Type: LAM On-board RF Generators: No RF Generator: ENI OEM-650A RF Hours: 402056 Remote RF Cart: No ATM Passivation Module: No Plasma LLK (PLL): No High Conductance Manifold: No Gas Box: Remote gas Box: No Orbitally welded GB: Yes Backside cooling MFC: Unit 1250A Gases: #1: N2, 200 sccm, Unit 1200A #2: CHF3, 50 sccm, Unit 1200A #3: N2, 300 sccm, Aera #4: N2, 500 sccm, Unit UFC 1660 #5: CF4, 150 sccm, Unit 1200A #6: SF6, 150 sccm, Unit 1200A #7: He, 1 slm, Unit UFC 1660 #8: O2, 200 sccm, Unit UFC 1660 Pump: Heated pumping manifolds: No Pump controller: iQ Series Entrance / Exit: Edwards iQDP-40 Main: Edwards iQDP-80 Chiller(s): (2) SMC HRS018-WN-20-M On-board AC Distribution type: Fused Power requirements: 208VAC, 3-Phase, 5-Wire
    OEMモデルの説明
    The LRC Rainbow Etchers are fully automated, in-line, single-wafer plasma/RIE etching systems that processes 6-inch, or 8-inch wafers and features top or/and bottom powered electrode plate, programmable electrode spacing, and automatic noncontact wafer alignment and placement. Unique RF match networks are located at the upper and lower electrodes for programmable switching between plasma and RIE modes. Designed for continuous operation, the LRC Rainbow etchers are computer-controlled, allowing either manual or automatic control. The Lam Rainbow 44XX Series can be for Tungsten silicide, Silicon nitride, polysilicon ,oxide, Crystallise Si etc.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    63314


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    1993


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 改修済み
    最終確認60日以上前

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 60日以上前
    listing-photo-5111deec793545edb0e504079a78b326-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/43570/5111deec793545edb0e504079a78b326/8af0de4a0b6a44f0b7d3e68908aa18d6_c32f11279e93444ebe59a56697a5ee981201a_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    63314


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    1993


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Plasma Etch
    構成
    Install Type: Thru-the-wall (TTW) Status Lamp System software (App): Envision ver1.5.1 SECS I Interface Cassette Interface: (2) Hine 38F indexers Electrostatic Chuck (ESC) Endpoint Detection: Monochromator 405nm / 520nm Turbo: Seiko Seiki STP H200C RF Match Type: LAM On-board RF Generators: No RF Generator: ENI OEM-650A RF Hours: 402056 Remote RF Cart: No ATM Passivation Module: No Plasma LLK (PLL): No High Conductance Manifold: No Gas Box: Remote gas Box: No Orbitally welded GB: Yes Backside cooling MFC: Unit 1250A Gases: #1: N2, 200 sccm, Unit 1200A #2: CHF3, 50 sccm, Unit 1200A #3: N2, 300 sccm, Aera #4: N2, 500 sccm, Unit UFC 1660 #5: CF4, 150 sccm, Unit 1200A #6: SF6, 150 sccm, Unit 1200A #7: He, 1 slm, Unit UFC 1660 #8: O2, 200 sccm, Unit UFC 1660 Pump: Heated pumping manifolds: No Pump controller: iQ Series Entrance / Exit: Edwards iQDP-40 Main: Edwards iQDP-80 Chiller(s): (2) SMC HRS018-WN-20-M On-board AC Distribution type: Fused Power requirements: 208VAC, 3-Phase, 5-Wire
    OEMモデルの説明
    The LRC Rainbow Etchers are fully automated, in-line, single-wafer plasma/RIE etching systems that processes 6-inch, or 8-inch wafers and features top or/and bottom powered electrode plate, programmable electrode spacing, and automatic noncontact wafer alignment and placement. Unique RF match networks are located at the upper and lower electrodes for programmable switching between plasma and RIE modes. Designed for continuous operation, the LRC Rainbow etchers are computer-controlled, allowing either manual or automatic control. The Lam Rainbow 44XX Series can be for Tungsten silicide, Silicon nitride, polysilicon ,oxide, Crystallise Si etc.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etchヴィンテージ: 0状態: 改修済み最終検証:60日以上前
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:60日以上前
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:60日以上前