説明
Metal Etch構成
2300 KIYO EXOEMモデルの説明
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証: 13日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
62675
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 VERSYS KIYO
カテゴリ
Dry / Plasma Etch
最終検証: 13日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
62675
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Metal Etch構成
2300 KIYO EXOEMモデルの説明
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.ドキュメント
ドキュメントなし