説明
Etch / ashing system構成
MW chamberOEMモデルの説明
Lam’s 2300 Versys Star silicon etch system is designed to meet the challenging needs of sub-90-nm technologies. It delivers superior performance on complex film stacks and meets the requirements for next-generation silicon etch processes to sub-65 nm. The system provides excellent CD bias uniformity, enabled by the industry’s first technologies for tuning gas flows and wafer temperature with step-by-step settings. This allows flexibility in designing the process across the wafer and between steps, leading to a larger process window that can accommodate an extensive variety of applications, wafer types, and film types. The 2300 Versys Star is available as an upgrade to existing 2300 Versys systems.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
152699
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 VERSYS STAR
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
152699
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Etch / ashing system構成
MW chamberOEMモデルの説明
Lam’s 2300 Versys Star silicon etch system is designed to meet the challenging needs of sub-90-nm technologies. It delivers superior performance on complex film stacks and meets the requirements for next-generation silicon etch processes to sub-65 nm. The system provides excellent CD bias uniformity, enabled by the industry’s first technologies for tuning gas flows and wafer temperature with step-by-step settings. This allows flexibility in designing the process across the wafer and between steps, leading to a larger process window that can accommodate an extensive variety of applications, wafer types, and film types. The 2300 Versys Star is available as an upgrade to existing 2300 Versys systems.ドキュメント
ドキュメントなし