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LAM RESEARCH CORPORATION TCP 9600SE
    説明
    ETCH
    構成
    ETCH
    OEMモデルの説明
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH CORPORATION

    TCP 9600SE

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    83906


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 中古
    最終確認30日以上前

    LAM RESEARCH CORPORATION

    TCP 9600SE

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 60日以上前
    listing-photo-b0c6c90f81744a55b8f88997f9ed77fd-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    83906


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    ETCH
    構成
    ETCH
    OEMモデルの説明
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:30日以上前
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:60日以上前
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:60日以上前