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LAM RESEARCH CORPORATION TCP 9100PTX
    説明
    LAM A6 TCP-9400PTX
    構成
    構成なし
    OEMモデルの説明
    Lam's TCP product line of high-density, low-pressure etch systems, which was introduced in late 1992, incorporates the Company's patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. The Company currently offers the TCP 9600SEII and TCP 9600PTX for metal etch applications, the TCP 9400SEII and TCP 9400PTX for polysilicon, polycide and shallow trench isolation etch applications and the TCP 9100 and TCP 9100PTX for oxide etch applications.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 3日前

    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    148237


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9100PTX

    LAM RESEARCH CORPORATION

    TCP 9100PTX

    Dry / Plasma Etch
    ヴィンテージ: 2000状態: 中古
    最終確認60日以上前

    LAM RESEARCH CORPORATION

    TCP 9100PTX

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 3日前
    listing-photo-64c7cc01a8f8425ab6766173502217ec-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    148237


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    LAM A6 TCP-9400PTX
    構成
    構成なし
    OEMモデルの説明
    Lam's TCP product line of high-density, low-pressure etch systems, which was introduced in late 1992, incorporates the Company's patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. The Company currently offers the TCP 9600SEII and TCP 9600PTX for metal etch applications, the TCP 9400SEII and TCP 9400PTX for polysilicon, polycide and shallow trench isolation etch applications and the TCP 9100 and TCP 9100PTX for oxide etch applications.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9100PTX

    LAM RESEARCH CORPORATION

    TCP 9100PTX

    Dry / Plasma Etchヴィンテージ: 2000状態: 中古最終検証:60日以上前
    LAM RESEARCH CORPORATION TCP 9100PTX

    LAM RESEARCH CORPORATION

    TCP 9100PTX

    Dry / Plasma Etchヴィンテージ: 2000状態: 中古最終検証:60日以上前
    LAM RESEARCH CORPORATION TCP 9100PTX

    LAM RESEARCH CORPORATION

    TCP 9100PTX

    Dry / Plasma Etchヴィンテージ: 0状態: 改修済み最終検証:3日前