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LAM RESEARCH CORPORATION TCP 9400DFM
    説明
    Polysilicon Etch
    構成
    構成なし
    OEMモデルの説明
    Lam’s TCP 9400DFM is an advanced silicon etch system for 200mm wafers, designed to meet gate and STI etch requirements down to the 130nm technology node. It is capable of running multiple applications in situ, increasing process flexibility, reliability, and productivity. The system features SymFlo™, a symmetrical flow gas distribution system, and Voltage Control Interface™ (VCI™), a closed-loop system that enhances chamber matching capabilities. It also incorporates Lam’s unique Waferless Auto Clean™ (WAC™) technology, which offers world-class mean time between cleans (MTBC). An optional interferometric endpoint system provides repeatable endpoint capability. The TCP 9400DFM offers upgrade capability for Lam’s highly successful TCP 9400PTX.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 30日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    122873


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9400DFM

    LAM RESEARCH CORPORATION

    TCP 9400DFM

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 中古
    最終確認30日以上前

    LAM RESEARCH CORPORATION

    TCP 9400DFM

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 30日以上前
    listing-photo-c2de15eb2d0346418d4b1f4be3af8669-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    122873


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Polysilicon Etch
    構成
    構成なし
    OEMモデルの説明
    Lam’s TCP 9400DFM is an advanced silicon etch system for 200mm wafers, designed to meet gate and STI etch requirements down to the 130nm technology node. It is capable of running multiple applications in situ, increasing process flexibility, reliability, and productivity. The system features SymFlo™, a symmetrical flow gas distribution system, and Voltage Control Interface™ (VCI™), a closed-loop system that enhances chamber matching capabilities. It also incorporates Lam’s unique Waferless Auto Clean™ (WAC™) technology, which offers world-class mean time between cleans (MTBC). An optional interferometric endpoint system provides repeatable endpoint capability. The TCP 9400DFM offers upgrade capability for Lam’s highly successful TCP 9400PTX.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9400DFM

    LAM RESEARCH CORPORATION

    TCP 9400DFM

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:30日以上前
    LAM RESEARCH CORPORATION TCP 9400DFM

    LAM RESEARCH CORPORATION

    TCP 9400DFM

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:30日以上前