説明

Alliance System Etcher

構成

PM Pump Type: Turbomolecular PM Pump Manufacturer: ALCATEL PM Pump Model: ATH1300M PM Pump Controller Model: ACT1300M Gas Panel: Gas Panel Facilities Hook Up: Side Feed Multi Line Gas Panel Type: Enhanced Gasbox (12 Gas line capacity) Gas Panel Type: Spooled Inlet Gas Panel MFC Type: Digital (Horiba Astec) Flow Calibration: Flow Verification Self Check Set Heated Gas Line: No Gas Filter: >=0.003um Gas Box Stacking: 4 PM Stacking Cable & Interconnect: PM to TCU: As required length between Chamber, Controller and Chiller PM to Pump: As required length between Chamber, Controller and Pump PM to Gas Box: As required length TM to Pump: As required length TM to RPM: As required length between tool and RPM Heater Cable Connector: As required Speed Connector for all heater cable connection for Male and Female Etching Process: Pump Ballast: With AOV 85 Chamber manometer: MKS 0.1Torr Turbo manometer: MKS 10Torr; Chamber to manometer is with 90deg elbow Foreline manometer: MKS 10Torr Pressure control valve: Pendulum VAT65; Software：65PM.3E.20 Helium Pressure control unit: Unit 8130 ESC Model: 718-094523-281 (Notch) ESC Type: Bipola Anodize ESC Power Voltage: 750V Power Supply: 24 VDC . Supply new type ( XP ) Chamber Configuration: Elevated Top Hat Direct Pressure Monitoring: Yes He Cooling Size (Center): 50 sccm Number of Gasline: 8 Gas line 1 02 (50 sccm) Digital, Horiba Stec Gas line 2 C2F6 (100 sccm) Digital, Horiba Stec Gas line 3 CL2 (100 sccm) Digital, Horiba Stec Gas line 4 HBr (350 sccm) Digital, Horiba Stec Gas line 5 He (500 sccm) Digital, Horiba Stec Gas line 6 20%02/He(20 sccm) Digital, Horiba Stec Gas line 7 CF4 (200 sccm) Digital, Horiba Stec Gas line 8 SF6 (200 sccm) Digital, Horiba Stec Gas line 9 Nil Gas line 10 Nil Gas line 11 Nil Gas line 12 Nil Operating Upper Cham Temp: 60 deg C Operation Wall Cham Temp: 60 deg C Operation Lower Cham Temp: 65 deg C Top RF Generator Model: AE: RFDS 1250 Top RF Generator : 660-024637-026 Top RF Generator Max Power: 1250W Top RF Generator Cooling Type: Water TCP Coil: 853-330601-001 TCP Match P/N: 853-032294-002 TCP Autotune PCB: 810-015987-101 Upper Match enclosure with Fan: Yes Bottom RF Generator Model: AE: RFG 1250-Halo Bottom RF Generator : 660-024637-028 Bottom RF Generator Max Power: 1250W Bottom RF Generator Cooling Type: Water Bottom Match P/N: 853-33091-021 Bottom DIP PCB: 810-017003-005

OEMモデルの説明

The TCP 9400PTX is a high-density, low-pressure etch system from Lam Research’s TCP product line. It incorporates the company’s patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. The system is designed for polysilicon, polycide, and shallow trench isolation etch applications. It operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. Independent power control to the lower electrode improves etch results across a wider process window. The TCP 9400PTX is designed to offer customers a reliable, lower cost of ownership solution for their advanced processing needs and is available as a stand-alone, single wafer configuration or in conjunction with the Alliance multi-chamber cluster platform.