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LAM RESEARCH CORPORATION TCP 9400PTX
    説明
    9/1/26
    構成
    構成なし
    OEMモデルの説明
    The TCP 9400PTX is a high-density, low-pressure etch system from Lam Research’s TCP product line. It incorporates the company’s patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. The system is designed for polysilicon, polycide, and shallow trench isolation etch applications. It operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. Independent power control to the lower electrode improves etch results across a wider process window. The TCP 9400PTX is designed to offer customers a reliable, lower cost of ownership solution for their advanced processing needs and is available as a stand-alone, single wafer configuration or in conjunction with the Alliance multi-chamber cluster platform.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 9日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    148122


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 中古
    最終確認9日前

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 9日前
    listing-photo-fd015759ba624f61bbbcef72dea00713-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    148122


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    9/1/26
    構成
    構成なし
    OEMモデルの説明
    The TCP 9400PTX is a high-density, low-pressure etch system from Lam Research’s TCP product line. It incorporates the company’s patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. The system is designed for polysilicon, polycide, and shallow trench isolation etch applications. It operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. Independent power control to the lower electrode improves etch results across a wider process window. The TCP 9400PTX is designed to offer customers a reliable, lower cost of ownership solution for their advanced processing needs and is available as a stand-alone, single wafer configuration or in conjunction with the Alliance multi-chamber cluster platform.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:9日前
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:15日前
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:15日前