説明
CVD Chemical Vapor Deposition構成
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEMモデルの説明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.ドキュメント
ドキュメントなし
MATTSON
ASPEN II
検証済み
カテゴリ
Dry / Plasma Etch
最終検証: 27日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
66491
ウェーハサイズ:
6"/150mm
ヴィンテージ:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示MATTSON
ASPEN II
カテゴリ
Dry / Plasma Etch
最終検証: 27日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
66491
ウェーハサイズ:
6"/150mm
ヴィンテージ:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
CVD Chemical Vapor Deposition構成
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEMモデルの説明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.ドキュメント
ドキュメントなし