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説明
CVD Chemical Vapor Deposition構成
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEMモデルの説明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.ドキュメント
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MATTSON
ASPEN II
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66491
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2007
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説明
CVD Chemical Vapor Deposition構成
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEMモデルの説明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.ドキュメント
ドキュメントなし