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説明
ICP double Chmbaer構成
Process chamber(ICP) X 2 Slit door X 2 Heater block X 2 Lift Pin X 2 Top plate X 2 Robot X 1 Shuttle X 1 Cassette nest X 1 Shuttle dump X 1 Loadlock X 1 Cooling cahmebr X 1 Operator Box X 1 Temp panel X 2 Gas panel X 2 Gas box X 2 Cassdoor X 1 ARM X 1 Paddle X 2 DC BOX X 1 AC BOX X 1OEMモデルの説明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.ドキュメント
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
102019
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
HDD / Software:
Yes
Pumps:
NO
Process:
STRIP
Plasma Gas:
CF4,H2N2,O2,N2
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
MATTSON
ASPEN II
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
102019
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
HDD / Software:
Yes
Pumps:
NO
Process:
STRIP
Plasma Gas:
CF4,H2N2,O2,N2
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available