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説明
Stripper/Asher構成
構成なしOEMモデルの説明
The Aspen III’s exceptional platform design can handle both 200 mm and 300 mm wafers, and supports special wafer handling including warped and translucent wafers. The unique process chamber architecture can accommodate technical requirements across multiple technology nodes for the most demanding device manufacturers in the industry.ドキュメント
ドキュメントなし
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MATTSON
ASPEN III
カテゴリ
Dry / Plasma Etch
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
106466
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
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説明
Stripper/Asher構成
構成なしOEMモデルの説明
The Aspen III’s exceptional platform design can handle both 200 mm and 300 mm wafers, and supports special wafer handling including warped and translucent wafers. The unique process chamber architecture can accommodate technical requirements across multiple technology nodes for the most demanding device manufacturers in the industry.ドキュメント
ドキュメントなし