説明
説明なし構成
構成なしOEMモデルの説明
Built on the paradigmE product architecture, paradigmE Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigmE Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
14960
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MATTSON
paradigmE SI
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
14960
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
Built on the paradigmE product architecture, paradigmE Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigmE Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership.ドキュメント
ドキュメントなし