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MATTSON paradigm SI
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    Built on the paradigm product architecture, paradigm Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigm Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership. The paradigm Si is specifically targeted at semi-critical poly etch applications by providing excellent process performance with over 30% better cost-of ownership advantages over any competitive etch system currently on the market.
    ドキュメント

    ドキュメントなし

    MATTSON

    paradigm SI

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    86581


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2011


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch
    ヴィンテージ: 2011状態: 中古
    最終確認60日以上前

    MATTSON

    paradigm SI

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 60日以上前
    listing-photo-a0c124cf22fa4e47919af8b5e4903d61-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    86581


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2011


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    Built on the paradigm product architecture, paradigm Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigm Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership. The paradigm Si is specifically targeted at semi-critical poly etch applications by providing excellent process performance with over 30% better cost-of ownership advantages over any competitive etch system currently on the market.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etchヴィンテージ: 2011状態: 中古最終検証:60日以上前
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etchヴィンテージ: 2012状態: 中古最終検証:60日以上前
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etchヴィンテージ: 2011状態: 中古最終検証:60日以上前