説明
説明なし構成
構成なしOEMモデルの説明
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 7日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
145811
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NORDSON / MARCH
Jupiter III
カテゴリ
Dry / Plasma Etch
最終検証： 7日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
145811
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.ドキュメント
ドキュメントなし