説明
説明なし構成
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEMモデルの説明
Etching Systemドキュメント
ドキュメントなし
OXFORD
100 180 ICP
検証済み
カテゴリ
Dry / Plasma Etch
最終検証: 30日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
Deinstalled
製品ID:
113484
ウェーハサイズ:
8"/200mm
ヴィンテージ:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
100 180 ICP
カテゴリ
Dry / Plasma Etch
最終検証: 30日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
Deinstalled
製品ID:
113484
ウェーハサイズ:
8"/200mm
ヴィンテージ:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEMモデルの説明
Etching Systemドキュメント
ドキュメントなし