説明
RIE Strip構成
構成なしOEMモデルの説明
The Vision 320 RIE provides etch capability for R&D, prototyping, and low volume production. This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering. This system, found in both academic and industrial environments, is a result of their small footprint along with robust construction that focuses on ease of use and low maintenance. The Vision systems satisfy the high reliability requirements for critical applications such as delayering where production is dependent on constant input from the Failure Analysis department. Being outside of the fabrication process, means that the system must have turnkey operation for non-etch process oriented engineers.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
140107
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PLASMATHERM
Vision 320
カテゴリ
Dry / Plasma Etch
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
140107
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
RIE Strip構成
構成なしOEMモデルの説明
The Vision 320 RIE provides etch capability for R&D, prototyping, and low volume production. This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering. This system, found in both academic and industrial environments, is a result of their small footprint along with robust construction that focuses on ease of use and low maintenance. The Vision systems satisfy the high reliability requirements for critical applications such as delayering where production is dependent on constant input from the Failure Analysis department. Being outside of the fabrication process, means that the system must have turnkey operation for non-etch process oriented engineers.ドキュメント
ドキュメントなし