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STS PRO ICP
    説明
    ICP Etcher Complete
    構成
    Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 4日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    145586


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    STS PRO ICP

    STS

    PRO ICP

    Dry / Plasma Etch
    ヴィンテージ: 2007状態: 中古
    最終確認4日前

    STS

    PRO ICP

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 4日前
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    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    145586


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    ICP Etcher Complete
    構成
    Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    STS PRO ICP

    STS

    PRO ICP

    Dry / Plasma Etchヴィンテージ: 2007状態: 中古最終検証:4日前
    STS PRO ICP

    STS

    PRO ICP

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:60日以上前
    STS PRO ICP

    STS

    PRO ICP

    Dry / Plasma Etchヴィンテージ: 0状態: 改修済み最終検証:60日以上前