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APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD
    説明
    Electroplating
    構成
    構成なし
    OEMモデルの説明
    The Raider™ ECD is a fourth-generation single wafer electrochemical deposition tool that delivers advanced metal processing in a small footprint. It is an automated, multi-process tool that is available with cluster modules for metrology, plating, and cleaning. The Raider™ incorporates programmable reactors and can provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to provide advanced metal processing capabilities in a compact and efficient package.
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    ドキュメントなし

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD

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    検証済み

    カテゴリ

    Electro Plating
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    13867


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2009

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    Available
    Transaction Insured by Moov
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    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD
    APPLIED MATERIALS (AMAT) / SEMITOOLRAIDER ECDElectro Plating
    ヴィンテージ: 2010状態: 中古
    最終確認16日前

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD

    verified-listing-icon

    検証済み

    カテゴリ

    Electro Plating
    最終検証: 60日以上前
    listing-photo-8EF22JF2FU7aVmdGmaPXkhCqdZ4qdZr6FN4DrFU3jRE-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/OXrcQ5ToRrmvHW-tOifNY3DOLveaHNvaMGsW12XA0ww/8EF22JF2FU7aVmdGmaPXkhCqdZ4qdZr6FN4DrFU3jRE/kZi9zsx5zIF92yqw35Eo677-33Bb78ishapzqGk0OTk_20190315_104305_f
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    13867


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2009


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Electroplating
    構成
    構成なし
    OEMモデルの説明
    The Raider™ ECD is a fourth-generation single wafer electrochemical deposition tool that delivers advanced metal processing in a small footprint. It is an automated, multi-process tool that is available with cluster modules for metrology, plating, and cleaning. The Raider™ incorporates programmable reactors and can provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to provide advanced metal processing capabilities in a compact and efficient package.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD
    APPLIED MATERIALS (AMAT) / SEMITOOL
    RAIDER ECD
    Electro Platingヴィンテージ: 2010状態: 中古最終検証: 16日前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD
    APPLIED MATERIALS (AMAT) / SEMITOOL
    RAIDER ECD
    Electro Platingヴィンテージ: 2009状態: 中古最終検証: 16日前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD
    APPLIED MATERIALS (AMAT) / SEMITOOL
    RAIDER ECD
    Electro Platingヴィンテージ: 0状態: 中古最終検証: 23日前