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APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Raider™ ECD310 is a fourth-generation, single-wafer, automated, multi-process electrochemical deposition tool. It delivers advanced metal processing in a small footprint and is available with cluster modules for metrology, plating, and cleaning. The Raider™ ECD310 incorporates programmable reactors that provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to deliver advanced metal processing capabilities in a compact package.
    ドキュメント

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    verified-listing-icon

    検証済み

    カテゴリ
    Electro Plating

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    101022


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2010


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Plating
    ヴィンテージ: 2010状態: 中古
    最終確認60日以上前

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    verified-listing-icon
    検証済み
    カテゴリ
    Electro Plating
    最終検証: 60日以上前
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    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    101022


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2010


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Raider™ ECD310 is a fourth-generation, single-wafer, automated, multi-process electrochemical deposition tool. It delivers advanced metal processing in a small footprint and is available with cluster modules for metrology, plating, and cleaning. The Raider™ ECD310 incorporates programmable reactors that provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to deliver advanced metal processing capabilities in a compact package.
    ドキュメント
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Platingヴィンテージ: 2010状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Platingヴィンテージ: 0状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Platingヴィンテージ: 2009状態: 中古最終検証:60日以上前