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LAM RESEARCH / NOVELLUS SABRE
    説明
    Convectron Gauge
    構成
    構成なし
    OEMモデルの説明
    SABRE has been proven to provide void-free copper fill of sub-0.15 micron trench features (at 9 or 10:1 aspect ratios) and 0.25 micron vias (at 5:1 aspect ratios). SABRE employs a proprietary electrofilling cell that eliminates the backside wafer contamination of copper, and features a unique plating cell design that ensures reproducibility of the copper fill, with a film uniformity of 3 sigma, [5% with a wafer. SABRE requires only two types of process modules to complete the electrofill process, for electrofilling (3 stations total) and the other for spin/rinse/dry (another 3 stations). The resulting simplicity of this design is key to the system's high reliability and manufacturing availability.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH / NOVELLUS

    SABRE

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    検証済み

    カテゴリ

    Electro Plating
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    16378


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明

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    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUSSABREElectro Plating
    ヴィンテージ: 0状態: 中古
    最終確認30日前

    LAM RESEARCH / NOVELLUS

    SABRE

    verified-listing-icon

    検証済み

    カテゴリ

    Electro Plating
    最終検証: 60日以上前
    listing-photo-fAZ1tajmwshLTzqWdLkSQXA87R9JQkTKHH3AovWVi9g-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/fAZ1tajmwshLTzqWdLkSQXA87R9JQkTKHH3AovWVi9g/laHFB4ZdJ0AsUiKzC9eEdRjDT-aDO4JGKPZ2X1kfh2Y_20190315_091910_f
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    16378


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Convectron Gauge
    構成
    構成なし
    OEMモデルの説明
    SABRE has been proven to provide void-free copper fill of sub-0.15 micron trench features (at 9 or 10:1 aspect ratios) and 0.25 micron vias (at 5:1 aspect ratios). SABRE employs a proprietary electrofilling cell that eliminates the backside wafer contamination of copper, and features a unique plating cell design that ensures reproducibility of the copper fill, with a film uniformity of 3 sigma, [5% with a wafer. SABRE requires only two types of process modules to complete the electrofill process, for electrofilling (3 stations total) and the other for spin/rinse/dry (another 3 stations). The resulting simplicity of this design is key to the system's high reliability and manufacturing availability.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUS
    SABRE
    Electro Platingヴィンテージ: 0状態: 中古最終検証: 30日前
    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUS
    SABRE
    Electro Platingヴィンテージ: 0状態: 中古最終検証: 30日以上前
    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUS
    SABRE
    Electro Platingヴィンテージ: 0状態: 中古最終検証: 60日以上前