説明
Semiconductor Wafer Electroplating System Electroplating cup reactors for uniform films. Simple manual load system. Two chambers. Internal lines leached and exterior wiped clean. 208V, 3 Ph, 50/60 Hz, 40A構成
Model EQ212PMPLTNG150 EQUINOXOEMモデルの説明
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.ドキュメント
ドキュメントなし
SEMITOOL
EQUINOX
検証済み
カテゴリ
Wet processing
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
75903
ウェーハサイズ：
不明
ヴィンテージ：
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SEMITOOL
EQUINOX
検証済み
カテゴリ
Wet processing
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
75903
ウェーハサイズ：
不明
ヴィンテージ：
2010
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Semiconductor Wafer Electroplating System Electroplating cup reactors for uniform films. Simple manual load system. Two chambers. Internal lines leached and exterior wiped clean. 208V, 3 Ph, 50/60 Hz, 40A構成
Model EQ212PMPLTNG150 EQUINOXOEMモデルの説明
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.ドキュメント
ドキュメントなし