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説明
説明なし構成
AS-IS AMAT Centura HTF 3ch Epi system, ATM ‐ 200mm ‐ Centura 5200 HTF Toxic Epi mainframe - 480V/60Hz/600A - Wide Body ENP loadlocks ‐ Wafer mapping ‐ HP robot ‐ Remote Centerfinding ‐ Epi chamber RP Position: A, B, C * R3.4 rotation assy * Variable Speed Blower ‐ Single slot non-contact cooldown chamber, position F ‐ Legacy Gas Panel (USED) * H2 Slit - 20 SLM * H2 Main - 100 SLM * HCL - 1 SLM * DCS - 1 SLM (Not Used, was RP tool) * MixDop - 300 SCCM * TCS - 30 SLM * Direct Dop - 500 SCCMOEMモデルの説明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.ドキュメント
ドキュメントなし
カテゴリ
Epitaxial deposition (EPI)
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
67521
ウェーハサイズ：
不明
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA 5200 HTF
カテゴリ
Epitaxial deposition (EPI)
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
67521
ウェーハサイズ：
不明
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
AS-IS AMAT Centura HTF 3ch Epi system, ATM ‐ 200mm ‐ Centura 5200 HTF Toxic Epi mainframe - 480V/60Hz/600A - Wide Body ENP loadlocks ‐ Wafer mapping ‐ HP robot ‐ Remote Centerfinding ‐ Epi chamber RP Position: A, B, C * R3.4 rotation assy * Variable Speed Blower ‐ Single slot non-contact cooldown chamber, position F ‐ Legacy Gas Panel (USED) * H2 Slit - 20 SLM * H2 Main - 100 SLM * HCL - 1 SLM * DCS - 1 SLM (Not Used, was RP tool) * MixDop - 300 SCCM * TCS - 30 SLM * Direct Dop - 500 SCCMOEMモデルの説明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.ドキュメント
ドキュメントなし