説明
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm (4"" Deep Pocket ) The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.構成
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10Kg/EAOEMモデルの説明
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturingドキュメント
ドキュメントなし
NUFLARE
EGV-30GX
カテゴリ
Epitaxial deposition (EPI)
最終検証： 13日前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
152532
ウェーハサイズ：
4"/100mm
ヴィンテージ：
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm (4"" Deep Pocket ) The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.構成
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10Kg/EAOEMモデルの説明
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturingドキュメント
ドキュメントなし